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Proceedings Paper

Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair
Author(s): Patricia G. Blauner; Andrew D. Dubner; Alfred Wagner
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Paper Abstract

It has been assumed that the large carbon content of FIB deposited gold films used for x-ray mask repair (as much as 50 at.%) would require that repairs be considerably thicker than the mask absorber. This paper tests this assumption by comparing the printing characteristics of FIB deposited features of varying thicknesses with those of conventional features on a mask. Ion beam deposited features 0.5 micrometers thick are found to print with nominal dose and linewidth variation most closely matching that of conventional features (0.6 micrometers electroplated Au). The results indicates that considerably less deposited material is required for repair than would be supposed based on the composition of the ion beam deposited gold (50 at.% carbon). Examples of repaired features on masks and their corresponding printed images are shown. In addition, the influence of material redeposition during clear repair is discussed.

Paper Details

Date Published: 24 June 1993
PDF: 9 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146496
Show Author Affiliations
Patricia G. Blauner, IBM Thomas J. Watson Research Ctr. (United States)
Andrew D. Dubner, IBM Thomas J. Watson Research Ctr. (United States)
Alfred Wagner, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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