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Proceedings Paper

Efficient long-pulse excimer lasers at 222 and 308 nm
Author(s): Jean-Marc Hueber; N. Bernard; Bernard L. Fontaine; Philippe Ch. Delaporte
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Paper Abstract

Improvement in efficiency and specific output energy on an XeCl long pulse laser ((lambda) equals 308 nm) and the first achievement of long pulse (150 ns FWHM) laser emission from KrCl (B - > X) at (lambda) equals 222 nm are reported. The system, which includes x- ray preionization and double discharge (pulser/sustainer) excitation, allows potentially high laser efficiency from a small volume active medium with relatively low pressure Ne/Xe/HCl, Ne/Xe/BCl3, Ne/Kr/HCl and Ne/Kr/BCl3 working mixtures.

Paper Details

Date Published: 4 May 1993
PDF: 6 pages
Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); doi: 10.1117/12.144669
Show Author Affiliations
Jean-Marc Hueber, IMFM/CNRS (United States)
N. Bernard, IMFM/CNRS (France)
Bernard L. Fontaine, Institut de Mecanique des Fluides de Marseille (France)
Philippe Ch. Delaporte, IMFM/CNRS (France)


Published in SPIE Proceedings Vol. 1810:
9th International Symposium on Gas Flow and Chemical Lasers

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