Share Email Print
cover

Proceedings Paper

Repetitively pulsed HF chemical laser with high average power
Author(s): Henri Brunet; Michel Mabru; C. Vannier
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A compact, repetitively pulsed HF chemical laser, built with a gas recirculator loop to cool and process the gas mixture, is described. A simple corona phototriggered discharge operating in SF6/C2H6/Ne gas mixture is used to produce vibrationally excited HF molecules at typical pressures of 90 - 150 Torr. This laser produced over 5 J per pulse in single shot operation and a maximum average power of 500 W at a repetition rate of 110 Hz. The electrical efficiency is 3%.

Paper Details

Date Published: 4 May 1993
PDF: 4 pages
Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); doi: 10.1117/12.144647
Show Author Affiliations
Henri Brunet, Laserdot (France)
Michel Mabru, Laserdot (France)
C. Vannier, Laserdot (France)


Published in SPIE Proceedings Vol. 1810:
9th International Symposium on Gas Flow and Chemical Lasers

© SPIE. Terms of Use
Back to Top