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Proceedings Paper

Effects of H2O on atomic hydrogen generation in hydrogen plasma
Author(s): Jun Kikuchi; Masafumi Suzuki; Hiroshi Yano; Shuzo Fujimura
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Paper Abstract

Water vapor added hydrogen gas is discharged by microwave. Concentrations of hydrogen atoms are measured in the plasma by actinometry and in the downstream by electron spin resonance (ESR). When water vapor is added to hydrogen gas, the concentration of hydrogen atoms in the plasma increases to an amount three times greater than that of pure hydrogen gas and the concentration in the downstream increases to an amount 90 times greater. When hydrogen gas without water vapor is discharged, the concentration of hydrogen atoms decreases just after the discharge is turned on. When water vapor is added to hydrogen gas, however, this time dependence of hydrogen concentration is not observed.

Paper Details

Date Published: 16 April 1993
PDF: 7 pages
Proc. SPIE 1803, Advanced Techniques for Integrated Circuit Processing II, (16 April 1993); doi: 10.1117/12.142937
Show Author Affiliations
Jun Kikuchi, Fujitsu Ltd. (Japan)
Masafumi Suzuki, Fujitsu Ltd. (Japan)
Hiroshi Yano, Fujitsu Ltd. (Japan)
Shuzo Fujimura, Fujitsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 1803:
Advanced Techniques for Integrated Circuit Processing II
James A. Bondur; Gary Castleman; Lloyd R. Harriott; Terry R. Turner, Editor(s)

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