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Proceedings Paper

Optimally stable electron cyclotron resonance plasma generation for precise ULSI patterning
Author(s): Seiji Samukawa
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Paper Abstract

This paper discusses microwave absorption around the electron cyclotron resonance (ECR) region in relation to the magnetic field profiles and microwave conditions, and shows how to achieve stable, uniform, and efficient microwave absorption in an ECR plasma to prevent the instability. A high-performance multi-coil system and a new microwave introduction method developed for stable plasma generation are described. Experimental results show that sufficiently precise patterning suitable for practical use is achieved.

Paper Details

Date Published: 16 April 1993
PDF: 11 pages
Proc. SPIE 1803, Advanced Techniques for Integrated Circuit Processing II, (16 April 1993); doi: 10.1117/12.142921
Show Author Affiliations
Seiji Samukawa, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 1803:
Advanced Techniques for Integrated Circuit Processing II
James A. Bondur; Gary Castleman; Lloyd R. Harriott; Terry R. Turner, Editor(s)

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