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Proceedings Paper

Optimized replication of interferometrically generated deep diffractive structures by embossing into thermoplastics
Author(s): Günter Lensch; Peter Lippert; Horst Kreitlow; Christel Budzinski
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Paper Abstract

New optical elements can be realized interferometrically by generating holographic diffractive structures. For lasers in the infrared spectral region the rulings of these structures need to be 2 to 5 times deeper than in common uses. By structuring photoresists holographically, varying different parameters, ruling depths of 24 microns and depth to grating constants of 1.5 could be performed. These structures had been applied as masks to reactive ion etching in glass and copper. For economic embossing replication techniques nickel stampers had been manufactured by electroforming the diffractive photoresist structures. Optimization of the embossing parameters has been carried out successfully regarding different thermoplastic materials and the achievable diffraction efficiency.

Paper Details

Date Published: 15 April 1993
PDF: 8 pages
Proc. SPIE 1780, Lens and Optical Systems Design, 17800R (15 April 1993); doi: 10.1117/12.142821
Show Author Affiliations
Günter Lensch, NU TECH GmbH (Germany)
Peter Lippert, NU TECH GmbH (Germany)
Horst Kreitlow, Fachhochschule Ostfriesland (Germany)
Christel Budzinski, Berliner Institut für Optik (Germany)

Published in SPIE Proceedings Vol. 1780:
Lens and Optical Systems Design
Hannfried Zuegge, Editor(s)

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