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Proceedings Paper

Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II
Author(s): Masa-aki Kurihara; Masumi Arai; Hiroshi Fujita; Hisashi Moro-oka; Yoichi Takahashi; Hisatake Sano
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Paper Abstract

Two lithographic processes for phase-shift mask (PSM) manufacturing have been investigated. In particular, processes in E-beam (electron beam) lithography by use of a charge-dissipating layer of a conductive polymer are studied. Two commercial conductive polymers, TQV and ESPACER100, are found to work well for charge-dissipation. Three new resists along with CMS and EBR9 are evaluated regarding their properties necessary for patterning a shifter layer. Among them two new resists are demonstrated to be excellent. The effect of the number of data-blocks on the alignment accuracy is examined in delineation with a Hitachi HL-600, where each data-block has four fine-alignment marks. The examination suggests that the use of one or two data-blocks is practical. As to combination of writers for the Cr level and the shifter level, HL-600 - HL-600 gave better alignment accuracy than the other combinations, WW6000 - HL-600 and MEBES III - HL-600, did. The comparison between the E-beam and the laser writers is summarized.

Paper Details

Date Published: 26 March 1993
PDF: 12 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142150
Show Author Affiliations
Masa-aki Kurihara, Dai Nippon Printing Co. Ltd. (Japan)
Masumi Arai, Dai Nippon Printing Co. Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co. Ltd. (Japan)
Hisashi Moro-oka, Dai Nippon Printing Co. Ltd. (Japan)
Yoichi Takahashi, Dai Nippon Printing Co. Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co. Ltd. (Japan)


Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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