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Proceedings Paper

Application of laser scatterometry to characterize phase-shifting masks
Author(s): Susan M. Wilson; Gary A. Peterson; S. Sohail H. Naqvi; John Robert McNeil
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Paper Abstract

Laser scatterometry is a noncontact, rapid method of collecting and analyzing light scattered from a structure. We have applied optical scatter techniques to measure the surface roughness as well as the etch depth of phase shifting masks (PSMs). Experimental results and theoretical modeling are discussed.

Paper Details

Date Published: 26 March 1993
PDF: 12 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142147
Show Author Affiliations
Susan M. Wilson, Univ. of New Mexico (United States)
Gary A. Peterson, Univ. of New Mexico (United States)
S. Sohail H. Naqvi, Univ. of New Mexico (United States)
John Robert McNeil, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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