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Proceedings Paper

Interferometer for phase measurements in phase-shift masks
Author(s): Derek B. Dove; T. C. Chieu; Amalkumar P. Ghosh
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Paper Abstract

The etch depth of phase shift masks is typically measured by means of profilometry and the expected phase shift is calculated from a knowledge of the refractive index at the lithographic wavelength of interest. In the case of masks utilizing deposited films the index may differ from values for bulk materials and commonly varies to some degree with method of deposition. The interferometer offers a method for the measurement of phase directly and, hence, for a means to obtain refractive index values for phase shift films on quartz blank substrates. Arrangements are described for direct phase measurements using visible, 632.8 nm, and UV, 257 nm, radiation.

Paper Details

Date Published: 26 March 1993
PDF: 9 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142132
Show Author Affiliations
Derek B. Dove, IBM Thomas J. Watson Research Ctr. (United States)
T. C. Chieu, IBM Thomas J. Watson Research Ctr. (United States)
Amalkumar P. Ghosh, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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