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Proceedings Paper

Integrated optical pressure sensor with coupling structures
Author(s): Joerg Mueller; Dieter Zurhelle; Kai H. Fischer; Andrea Loeffler-Peters; Rainer Hoffmann
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Paper Abstract

Silicon technology is a well known, controlled technology, which has the advantage that optical and electronic circuits as well as micromechanics can be integrated on the same substrate. This paper presents the design and the realization of an integrated optical pressure sensor. It includes a Mach-Zehnder interferometer, coupling structures of waveguide to fiber and optical detectors, which are integrated into the silicon substrate. As silicon is the detector material wavelengths below 1 micrometers are used. The fiber coupling structure is realized by means of plasma- or KOH-etching. Microoptical lenses with a focal length near 1.0 mm fabricated by Laser-CVD may reduce coupling losses. The interferometer consists of strip- loaded waveguides made of an SiO2-SiON-SiO2 sandwich deposited on the silicon substrate by an LPCVD- or PECVD-process. For pressure sensing a membrane beneath one of the interferometer paths is micromachined from the reverse side by a fast plasma etching process. The optical detection is accomplished by an endfire coupling structure consisting of an antireflectivity coated vertical silicon PIN-diode integrated in a 15 micrometers epilayer at a step in the substrate.

Paper Details

Date Published: 6 April 1993
PDF: 12 pages
Proc. SPIE 1794, Integrated Optical Circuits II, (6 April 1993); doi: 10.1117/12.141880
Show Author Affiliations
Joerg Mueller, Technische Univ. Hamburg-Harburg (Germany)
Dieter Zurhelle, Technische Univ. Hamburg-Harburg (Germany)
Kai H. Fischer, Technische Univ. Hamburg-Harburg (Germany)
Andrea Loeffler-Peters, Technische Univ. Hamburg-Harburg (Germany)
Rainer Hoffmann, Technische Univ. Hamburg-Harburg (Germany)


Published in SPIE Proceedings Vol. 1794:
Integrated Optical Circuits II
Ka-Kha Wong, Editor(s)

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