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Proceedings Paper

Monte Carlo simulation of submicron Si p-MOSFETs
Author(s): Maxim Ershov; J. Ershova; Victor Ryzhii
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Paper Abstract

Simulation of submicrometer silicon p-channel MOSFETs using the Monte Carlo (MC) method is presented in this paper. A two-dimensional device simulator has been developed to investigate hot-carrier, nonstationary transport. The space-charge effects are included through the self-consistent 2-D Poisson solution. Ionized impurity, inter- and intravalley scattering with acoustic and nonpolar-optical phonons as well as impact ionization (II) have been taken into account in our model. The classical partial diffusive model is employed for surface scattering process. It was found that the average drift velocity indicates an overshoot at the pinched-off region of the device. The comparison with results of drift-diffusion (DD) simulation has shown the negligible difference in I-V curves obtained by the MC and DD calculations for devices with channel length greater than 0.2 micrometers .

Paper Details

Date Published: 1 August 1992
PDF: 10 pages
Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992); doi: 10.1117/12.141063
Show Author Affiliations
Maxim Ershov, Institute of Physics and Technology (Russia)
J. Ershova, Institute of Physics and Technology (Russia)
Victor Ryzhii, Institute of Physics and Technology (Russia)


Published in SPIE Proceedings Vol. 1783:
International Conference of Microelectronics: Microelectronics '92

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