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Proceedings Paper

Preparation and properities of high-index oxide films for application to laser optics
Author(s): Dieter Schaefer; V. Guepner; Reinhard Wolf; Bernhard Steiger; G. Pfeifer; J. Franke
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Paper Abstract

HfO2, Y203, and Sc2O3 thin films and multilayer systems in combination with SiO2 as a low index component were deposited by laser beam evaporation. Absorption was measured by photothermal displacement spectroscopy at the wavelength of 1060 nm, whereas laser damage thresholds were determined at 248 and 1060 nm. Relations between laser damage, absorption, and thin film preparation are investigated.

Paper Details

Date Published: 4 March 1993
PDF: 8 pages
Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); doi: 10.1117/12.141046
Show Author Affiliations
Dieter Schaefer, Berliner Institut fuer Optik GmbH (Germany)
V. Guepner, Berliner Institut fuer Optik GmbH (Germany)
Reinhard Wolf, Ingenieurhochschule Mittweida (Germany)
Bernhard Steiger, Ingenieurhochschule Mittweida (Germany)
G. Pfeifer, Ingenieurhochschule Mittweida (Germany)
J. Franke, Ingenieurhochschule Mittweida (Germany)

Published in SPIE Proceedings Vol. 1782:
Thin Films for Optical Systems
Karl H. Guenther, Editor(s)

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