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Proceedings Paper

Stable starting materials of tantalum pentaoxide and titanium dioxide
Author(s): Shigetaro Ogura; Tomonori Aoki
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Paper Abstract

For obtaining thermally resistive and stable high-index materials, Ta2O5 films from a noble starting material of Ta2O5 + Ta (7 wt% added) have been developed, considering the analogy established in the case of TiO2 films. The related optical (refractive index and absorption) and stress properties both of Ta2O5 and TiO2 films are reported.

Paper Details

Date Published: 4 March 1993
PDF: 9 pages
Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); doi: 10.1117/12.141016
Show Author Affiliations
Shigetaro Ogura, Kobe Design Univ. (Japan)
Tomonori Aoki, Optron, Inc. (Japan)

Published in SPIE Proceedings Vol. 1782:
Thin Films for Optical Systems
Karl H. Guenther, Editor(s)

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