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Proceedings Paper

Fabrication and optical characteristics of microlens arrays engraved in photoresist coatings
Author(s): Francoise Gex; Gerard Roblin; Guy Edouard Artzner; L. Bernstein; David Horville; V. Serpette
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Paper Abstract

We have developed a technique for fabricating microlens arrays by engraving photoresist coatings. These microlens arrays are designed for astronomical applications for atmospheric wavefront sensors. First, we describe the apparatus and the manufacturing process. Second, we review the characteristics of the different photoresist types used in this process. Third, we report on the different optical testing methods to measure the microlens' performances. Then we deduce the several inherent advantages and limitations of this method. Fourth, we show how to produce monolithic arrays using ion beam milling with photoresist microlens arrays as a pattern and we demonstrate how these arrays can improve upon the performances of photoresist arrays.

Paper Details

Date Published: 1 January 1993
PDF: 12 pages
Proc. SPIE 1781, Specification and Measurement of Optical Systems, (1 January 1993); doi: 10.1117/12.140980
Show Author Affiliations
Francoise Gex, Observatoire de Paris-LARCA (France)
Gerard Roblin, Institut d'Optique Theorique et Appliquee/IOTA (France)
Guy Edouard Artzner, Institut d'Astrophysique Spatiale/IAS (France)
L. Bernstein, Institut d'Optique Theorique et Appliquee/IOTA (France)
David Horville, Observatoire de Paris-LARCA (France)
V. Serpette, Observatoire de Paris-LARCA (France)

Published in SPIE Proceedings Vol. 1781:
Specification and Measurement of Optical Systems
Lionel R. Baker, Editor(s)

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