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Proceedings Paper

Evaluation of the ultraviolet/ozone technique for on-orbit removal of photolyzed molecular contamination from optical surfaces
Author(s): Mark E. Frink; Mark A. Folkman; Lane A. Darnton
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Paper Abstract

Molecular species outgassed from spacecraft materials adhere tenaciously to and darken spacecraft surfaces when exposed to solar ultraviolet (UV) radiation. Such deposits severely degrade the performance of optical systems operating at UV and visible wavelengths. Data is presented which demonstrates the feasibility of a UV/Ozone cleaning technique in removing such deposits in a space-compatible configuration without damage to the optical surface. The technique involves the UV irradiation of the optical surface in the presence of low pressure molecular oxygen, resulting in the photolytic formation of ozone (O3) and subsequent photochemical removal of the contamination.

Paper Details

Date Published: 18 December 1992
PDF: 9 pages
Proc. SPIE 1754, Optical System Contamination: Effects, Measurement, Control III, (18 December 1992); doi: 10.1117/12.140739
Show Author Affiliations
Mark E. Frink, TRW Space and Technology Group (United States)
Mark A. Folkman, TRW Space and Technology Group (United States)
Lane A. Darnton, TRW Space and Technology Group (United States)


Published in SPIE Proceedings Vol. 1754:
Optical System Contamination: Effects, Measurement, Control III
A. Peter M. Glassford, Editor(s)

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