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Proceedings Paper

Study on x-ray multilayer monochromator
Author(s): Changxin Zhou; Mao-Lian Li; Tongqun Miao; Xilin Lu; Li Ma; Qingxiang An; Guoli Liang
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Paper Abstract

At present natural crystal TLAP used usually is replaced by artificial coated with multilayer for X-ray fluorescence (XRF) spectral analysis. X-ray multilayer monochromator can be used for analyzing light elements such as F, Na, Mg etc. Diffraction intensity of the multilayer component is 5 times higher than that of TLAP. This paper describes operating principle, Fabrication method and technique of the X-ray multilayer monochromator and the components are used Model 3080 E sequential X-ray fluorescence spectroscope. The multilayer diffraction components are fabricated by means of coating alternatively multilayer with high and low electron density elements on single crystal silicon substrate by vapor deposition or sputtering. Gap between multilayers is d to be equivalent to lattice constant of crystal. Sample is excited to emit fluorescence with multi-wavelength when X-ray beam illuminates surface of the sample. Fluorescence emitted passes through collimator and incidences on multilayer diffraction component to be diffracted into various wavelengths which are corresponding some angles. Contents of elements in samples can be detected according to Bragg diffraction principle. Key technologies fabricating multilayer diffraction components are how to polish supersmooth surface substrate and to control d value of thickness of multilayer. Roughness of Si(111) substrate polished by us is up to 0.1 nm RMS. Gap d 2.5 nm between multilayers. It is very difficult to realize specification as mentioned above. Thicknesses of layers are controlled by quartz piezoelectric crystal and their monitor controlling errors is about 0.34 nm RMS. Ion sputtering device is adopted to improve surface finish and construct specialty of the layers. Finally we have developed multilayer diffraction components which have been used to analyze F, Na and Mg etc. by X-ray fluorescence spectroscope.

Paper Details

Date Published: 21 January 1993
PDF: 10 pages
Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140597
Show Author Affiliations
Changxin Zhou, Changchun Institute of Optics and Fine Mechanics (China)
Mao-Lian Li, Changchun Institute of Optics and Fine Mechanics (China)
Tongqun Miao, Changchun Institute of Optics and Fine Mechanics (China)
Xilin Lu, Changchun Institute of Optics and Fine Mechanics (China)
Li Ma, Changchun Institute of Optics and Fine Mechanics (China)
Qingxiang An, Ministry of Geology and Mineral Resources (China)
Guoli Liang, Ministry of Geology and Mineral Resources (China)


Published in SPIE Proceedings Vol. 1742:
Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

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