Share Email Print
cover

Proceedings Paper

Present and future requirements of soft x-ray projection lithography
Author(s): Hiroo Kinoshita
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A soft-X-ray projection lithography system using multilayer mirrors has been developed. To determine the feasibility of a high throughput and a large exposure area, a reduction system consisting of two-mirror optics and a reflection mask were designed, fabricated, and assembled; and some trial replications of fine patterns were carried out. A full 4-inch wafer reflection mask was fabricated using a new process, and a high contrast and uniform quality throughout was obtained. Using the reflection mask, fine patterns of less than 0.25 micrometers and covering an area of 2 mm X 0.6 mm were faithfully replicated at a demagnification of 1/5.

Paper Details

Date Published: 21 January 1993
PDF: 9 pages
Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140589
Show Author Affiliations
Hiroo Kinoshita, NTT LSI Labs. (Japan)


Published in SPIE Proceedings Vol. 1742:
Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

© SPIE. Terms of Use
Back to Top