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Proceedings Paper

Multilayer thin-film design as far-ultraviolet polarizers
Author(s): Jongmin Kim; Muamer Zukic; Douglas G. Torr
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Paper Abstract

We use a concept of induced transmission and absorption to design multilayer thin film reflection polarizers in the FUV region. We achieve high s-polarization reflectance and a high degree of polarization by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of aluminum as the substrate. For convenience they are designed at a 45 deg angle of incidence. For example, our polarizer designed for the Lyman-alpha line (121.6 nm) has 88.67 percent reflectance for the s-polarization case, and 1.21 percent for the p-polarization case, with a degree of polarization of 97.31 percent. If we make a double surface polarizer with this design, it will have a degree of polarization of 99.96 percent and s-polarization throughput of 78.62 percent.

Paper Details

Date Published: 21 January 1993
PDF: 10 pages
Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140575
Show Author Affiliations
Jongmin Kim, Univ. of Alabama in Huntsville (United States)
Muamer Zukic, Univ. of Alabama in Huntsville (United States)
Douglas G. Torr, Univ. of Alabama in Huntsville (United States)


Published in SPIE Proceedings Vol. 1742:
Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

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