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Proceedings Paper

Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering
Author(s): Katsuhiko Murakami; Hiroshi Nakamura; Tetsuya Oshino; Masayuki Ohtani; Hiroshi Nagata
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Paper Abstract

Molybdenum/silicon multilayers were deposited by ion beam sputtering and radio-frequency magnetron sputtering. X-ray reflection, transmission electron microscopy and Auger electron spectroscopy studies were performed to characterize these multilayers. There was a difference in soft x-ray reflectivity. The reason for the difference was found to be the difference in the thickness of silicide layers which were formed at each interface of the multilayers.

Paper Details

Date Published: 21 January 1993
PDF: 7 pages
Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140572
Show Author Affiliations
Katsuhiko Murakami, Nikon Corp. (Japan)
Hiroshi Nakamura, Nikon Corp. (Japan)
Tetsuya Oshino, Nikon Corp. (Japan)
Masayuki Ohtani, Nikon Corp. (Japan)
Hiroshi Nagata, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 1742:
Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

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