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Proceedings Paper

Multilayer diffraction at 104-keV
Author(s): Allen S. Krieger; Richard L. Blake; D. Peter Siddons
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Paper Abstract

We have measured the diffraction peak of a W:Si synthetic multilayer reflector at 104 keV using the High Energy Bonse-Hart Camera at the X-17B hard X-ray wiggler beam line of the National Synchrotron Light Source at Brookhaven National Laboratory. The characteristics of the diffraction peak are described and compared to theory.

Paper Details

Date Published: 21 January 1993
PDF: 7 pages
Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140567
Show Author Affiliations
Allen S. Krieger, Radiation Science, Inc. (United States)
Richard L. Blake, Los Alamos National Lab. (United States)
D. Peter Siddons, Brookhaven National Lab. (United States)


Published in SPIE Proceedings Vol. 1742:
Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

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