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Proceedings Paper

Proximity-compensated kinoforms directly written by electron beam lithography
Author(s): Mats Ekberg; J. Michael Larsson; Fredrik K. Nikolajeff; Sverker Hard
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Paper Abstract

We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating.

Paper Details

Date Published: 2 March 1993
PDF: 2 pages
Proc. SPIE 1732, Holographics International '92, (2 March 1993); doi: 10.1117/12.140380
Show Author Affiliations
Mats Ekberg, Chalmers Univ. of Technology (Sweden)
J. Michael Larsson, Chalmers Univ. of Technology (Sweden)
Fredrik K. Nikolajeff, Chalmers Univ. of Technology (Sweden)
Sverker Hard, Chalmers Univ. of Technology (Sweden)


Published in SPIE Proceedings Vol. 1732:
Holographics International '92

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