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Proceedings Paper

Application of concept selection methodology in IC process design
Author(s): Myung-Kul Kim
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Paper Abstract

Search for an effective methodology practical in IC manufacturing process development led to trial of quantitative 'concept selection' methodology in selecting the 'best' alternative for interlevel dielectric (ILD) processes. A cross-functional team selected multi-criteria with scoring guidelines to be used in the definition of the 'best'. The project was targeted for the 3 level metal backend process for sub-micron gate array product. The outcome of the project showed that the maturity of the alternatives has strong influence on the scores, because scores on the adopted criteria such as yield, reliability and maturity will depend on the maturity of a particular process. At the same time, the project took longer than expected since it required data for the multiple criteria. These observations suggest that adopting a simpler procedure that can analyze total inherent controllability of a process would be more effective. The methodology of the DFS (design for simplicity) tools used in analyzing the manufacturability of such electronics products as computers, phones and other consumer electronics products could be used as an 'analogy' in constructing an evaluation method for IC processes that produce devices used in those electronics products. This could be done by focusing on the basic process operation elements rather than the layers that are being built.

Paper Details

Date Published: 14 January 1993
PDF: 8 pages
Proc. SPIE 1802, Microelectronics Manufacturing and Reliability, (14 January 1993); doi: 10.1117/12.139339
Show Author Affiliations
Myung-Kul Kim, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 1802:
Microelectronics Manufacturing and Reliability
Barbara Vasquez; Anant G. Sabnis; Kenneth P. MacWilliams; Jason C.S. Woo, Editor(s)

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