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Proceedings Paper

High-resolution optical lithography with a near-field scanning subwavelength aperture
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Paper Abstract

We report on a novel method for generating sub-micron lithographic patterns in photoresist through the use of a scanned sub-wavelength optical aperture. The aperture consists of the tip of a single-mode optical fiber that is drawn down to a diameter of 80 nm and coated with aluminum. The fiber tip is manipulated with a modified scanning tunneling microscope (STM) that brings the tip into proximity of a photoresist-coated substrate. The resolution is primarily a function of the aperture diameter and tip-to-sample separation. A linewidth of 200 nm has been achieved in preliminary experiments.

Paper Details

Date Published: 13 January 1993
PDF: 9 pages
Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); doi: 10.1117/12.138895
Show Author Affiliations
Fred Franklin Froehlich, Optical Sciences Ctr./Univ. of Arizona (United States)
Tomas D. Milster, Optical Sciences Ctr./Univ. of Arizona (United States)
R. Uber, Optical Sciences Ctr./Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 1751:
Miniature and Micro-Optics: Fabrication and System Applications II
Chandrasekhar Roychoudhuri; Wilfrid B. Veldkamp, Editor(s)

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