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Proceedings Paper

Artificial index surface relief diffraction optical elements
Author(s): Sergey V. Babin; Helmut Haidner; Peter Kipfer; Adolf Lang; John T. Sheridan; Wilhelm Stork; Norbert Streibl
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Paper Abstract

Using technologies originally developed for the electronics industry, like photolithography, e- beam writing, and dry etching, good quality diffractive elements with useful physical properties can be produced directly upon a given surface. Particularly interesting are grating structures in which the macroscopic properties differ from the microscopic properties. An example of this is when the dimensions of the micro-structure of the grating are much less than the incident wavelength. In this case the properties of the material in the microstructure are `averaged over,' in effect producing a new artificial or distributed index material. In this paper we discuss our preliminary results modelling, making, and measuring several such diffractive artificial index elements for use in the far IR.

Paper Details

Date Published: 13 January 1993
PDF: 12 pages
Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); doi: 10.1117/12.138882
Show Author Affiliations
Sergey V. Babin, Institute of Microelectronics Technology (Russia)
Helmut Haidner, Univ. Erlangen-Nuernberg (Germany)
Peter Kipfer, Univ. Erlangen-Nuernberg (Germany)
Adolf Lang, Univ. Erlangen-Nuernberg (Germany)
John T. Sheridan, Univ. Erlangen-Nuernberg (Germany)
Wilhelm Stork, Univ. Erlangen-Nuernberg (Germany)
Norbert Streibl, Univ. Erlangen-Nuernberg (Germany)


Published in SPIE Proceedings Vol. 1751:
Miniature and Micro-Optics: Fabrication and System Applications II
Chandrasekhar Roychoudhuri; Wilfrid B. Veldkamp, Editor(s)

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