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Proceedings Paper

Refractive-index and thickness measurements for an anisotropic film by S- and P-polarized reflectances
Author(s): Tami Kihara; Kiyoshi Yokomori
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Paper Abstract

A new technique is proposed for determining the refractive index and thickness of anisotropic films. Suppose the film is aligned in the X-Y plane, and that the plane of incidence includes the X-axis. From the reflectances of S- and P- polarized light, the principal refractive indices nx, ny, and nz can be obtained along with the film thickness d. First, ny and d can be derived from the S-polarized reflectance, since the S-polarization is parallel to the Y- axis. It is also possible to derive nx in the same way. The P-polarization is in the X-Z plane and Fresnel equations for P-polarization are expressed by nx, nz, and d. Therefore, nz can be determined using the P-polarized reflectance and the values already calculated for nx and d. Trial measurements are made on a Sol-Gel derived LiNbO3 film on an Al2O3 substrate, using a system with a reflectance measurement accuracy of the order of 0.01%. The values obtained for ny (equals nx), nz and d are 1.980, 2.056, and 107.5 nm, respectively. According to the results of this simulation, the accuracy of the obtained values can be estimated as < 0.3%.

Paper Details

Date Published: 11 December 1992
PDF: 10 pages
Proc. SPIE 1746, Polarization Analysis and Measurement, (11 December 1992); doi: 10.1117/12.138796
Show Author Affiliations
Tami Kihara, RICOH Co., Ltd. (Japan)
Kiyoshi Yokomori, RICOH Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1746:
Polarization Analysis and Measurement
Dennis H. Goldstein; Russell A. Chipman, Editor(s)

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