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Proceedings Paper

Atomic force microscopy employed as the final imaging stage for soft x-ray contact microscopy
Author(s): Robin A. Cotton; Mike D. Dooley; Julian H. Fletcher; Anthony D. Stead; Thomas W. Ford
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Paper Abstract

Soft x-ray contact microscopy (SXCM) enables a high resolution image of a living biological specimen to be recorded in an x-ray sensitive photoresist at unity magnification. Until recently scanning electron microscopes (SEM) have been employed to obtain the final magnified image. Although this has been successful in producing many high resolution images, this method of viewing the resist has several disadvantages. Firstly, a metallic coating has to be applied to the resist surface to provide electrical conductivity, rendering further development of the resist impossible. Also, electron beam damage to the resist surface can occur, in addition to poor resolution and image quality. Atomic force microscopy (AFM) allows uncoated resists to be imaged at a superior resolution, without damage to the surface. The use of AFM is seen as a major advancement in SXCM. The advantages and disadvantages of the two technologies are discussed, with illustrations from recent studies of a wide variety of hydrated biological specimens imaged using SXCM.

Paper Details

Date Published: 13 January 1993
PDF: 9 pages
Proc. SPIE 1741, Soft X-Ray Microscopy, (13 January 1993); doi: 10.1117/12.138733
Show Author Affiliations
Robin A. Cotton, Royal Holloway and Bedford New College (United Kingdom)
Mike D. Dooley, Rutherford Appleton Lab. (United Kingdom)
Julian H. Fletcher, Univ. of Oxford (United Kingdom)
Anthony D. Stead, Royal Holloway and Bedford New College (United Kingdom)
Thomas W. Ford, Royal Holloway and Bedford New College (United Kingdom)

Published in SPIE Proceedings Vol. 1741:
Soft X-Ray Microscopy
Chris J. Jacobsen; James E. Trebes, Editor(s)

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