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Proceedings Paper

XUV synchrotron optical components for the Advanced Light Source: fabrication and metrology
Author(s): David L. Lunt; Jonathan W. Bender; Donald G. Ewing; Wayne R. McKinney
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Paper Abstract

Third generation synchrotrons such as the Advanced Light Source impose severe restrictions on the allowable optical surface tolerances associated with the mirrors and diffraction grating substrates, if the high quality beam characteristics are to be utilized. We describe some of the fabrication and metrology techniques used to attain sub-microradian slope errors and surface roughness of 2 angstroms RMS on water cooled metal components.

Paper Details

Date Published: 20 January 1993
PDF: 12 pages
Proc. SPIE 1740, Optics for High-Brightness Synchrotron Radiation Beamlines, (20 January 1993); doi: 10.1117/12.138698
Show Author Affiliations
David L. Lunt, Photon Sciences International, Inc. (United States)
Jonathan W. Bender, Rockwell Power Systems (United States)
Donald G. Ewing, Rockwell Power Systems (United States)
Wayne R. McKinney, Lawrence Berkeley Lab. (United States)


Published in SPIE Proceedings Vol. 1740:
Optics for High-Brightness Synchrotron Radiation Beamlines
John R. Arthur, Editor(s)

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