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Proceedings Paper

Multilevel grating array illuminators in fused silica
Author(s): J. Michael Miller; Mohammad R. Taghizadeh; Jari Pekka Turunen; Neil Ross; Antti H. Vasara
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Paper Abstract

In this paper we discuss the design, fabrication, and performance of multi-level grating array illuminators. A complete fabrication error analysis is carried out for one dimensional designs with sixteen equally spaced relief levels. Array illuminators with eight/sixteen relief depth levels are fabricated in fused silica using reactive ion etching and photolithography with three/four electron bema binary amplitude masks. Fanouts as large as 32 X 16 and efficiencies > 90% have been achieved, which to our knowledge are the largest and most efficient realized to date using multi-level relief structures.

Paper Details

Date Published: 5 January 1993
PDF: 9 pages
Proc. SPIE 1718, Workshop on Digital Holography, (5 January 1993); doi: 10.1117/12.138559
Show Author Affiliations
J. Michael Miller, Heriot-Watt Univ. (United Kingdom)
Mohammad R. Taghizadeh, Heriot-Watt Univ. (United Kingdom)
Jari Pekka Turunen, Heriot-Watt Univ. (United Kingdom)
Neil Ross, Heriot-Watt Univ. (United Kingdom)
Antti H. Vasara, Helsinki Univ. of Technology (Finland)

Published in SPIE Proceedings Vol. 1718:
Workshop on Digital Holography

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