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Proceedings Paper

Performance characteristics of thin film resistor arrays for infrared projector applications
Author(s): Owen M. Williams; Geoffrey K. Reeves; Gim T. Ong
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Paper Abstract

The thin film resistor array choice of infrared projector technology is characterized by the comparatively large values of pixel fill factor and emissivity that can be attained but is limited by materials and heat transfer constraints. In this paper, the characteristics and limitations of an infrared projector test device based on a 2 X 25 bilinear thin film nichrome resistor array are described. The steady state and transient performance characteristics have each been assessed by use of both analytical and finite element heat transfer techniques. Test devices based on the design that gave the best predicted performance have been fabricated on a silicon wafer substrate by application of the conventional techniques of photolithography, etching and vacuum deposition, each array being comprised of a patterned polyimide insulation layer sandwiched between the substrate and the nichrome heating elements. Initial characterization experiments have demonstrated a 200 degree(s)C operating temperature capability and 10 - 90% rise and fall times of the order of 100 - 200 microsecond(s) . It is shown that the risetime can be improved significantly by application of a tailored drive voltage waveform, as can the falltime of appropriate thermal connection of the substrate to a low temperature heat sink. Modes of device failure are also discussed.

Paper Details

Date Published: 21 September 1992
PDF: 11 pages
Proc. SPIE 1687, Characterization, Propagation, and Simulation of Sources and Backgrounds II, (21 September 1992); doi: 10.1117/12.137824
Show Author Affiliations
Owen M. Williams, Defense Science and Technology Organisation (Australia)
Geoffrey K. Reeves, Royal Melbourne Institute of Technology (Australia)
Gim T. Ong, Royal Melbourne Institute of Technology (Australia)


Published in SPIE Proceedings Vol. 1687:
Characterization, Propagation, and Simulation of Sources and Backgrounds II
Dieter Clement; Wendell R. Watkins, Editor(s)

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