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Proceedings Paper

Optimization of partially coherent illumination in x-ray lithography (Poster Paper)
Author(s): Franco Cerrina; Jerry Z.Y. Guo
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Paper Abstract

Based on the simplified yet accurate model we developed, a route to an optimized x-ray lithography system is defined. It predicts a large exposure window with a less coherent illumination than those currently used in most synchrotron radiation based exposure systems. Two different schemes of coherence reduction are proposed and their effects are simulated.

Paper Details

Date Published: 9 July 1992
PDF: 9 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136046
Show Author Affiliations
Franco Cerrina, Univ. of Wisconsin/Madison (United States)
Jerry Z.Y. Guo, Univ. of Wisconsin/Madison (United States)


Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)

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