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Proceedings Paper

Development of XUV projection lithography at 60-80 nm (Poster Paper)
Author(s): Brian Emerson Newnam; Vriddhachalam K. Viswanathan
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Paper Abstract

The rationale, design, component properties, and potential capabilities of extreme-ultraviolet (XUV) projection lithography systems using 60 - 80 nm illumination and single-surface reflectors are described. These systems are evaluated for potential application to high-volume production of future generations of gigabit chips.

Paper Details

Date Published: 9 July 1992
PDF: 18 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136044
Show Author Affiliations
Brian Emerson Newnam, Los Alamos National Lab. (United States)
Vriddhachalam K. Viswanathan, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)

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