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Proceedings Paper

Model and measurement of resist heating effect in EBL (Poster Paper)
Author(s): Sergey V. Babin; Ivan Kostic; A. A. Svintsov
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Paper Abstract

Measurements of dose characteristics of PMMA were performed with various resist temperatures. The quantitative data shows sensitivity changes with the temperature increase. The model of resist heating effect is presented and a possible technique to correct distortions due to resist heating is discussed.

Paper Details

Date Published: 9 July 1992
PDF: 5 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136030
Show Author Affiliations
Sergey V. Babin, Institute of Microelectronics Technology (Russia)
Ivan Kostic, Institute of Technical Cybernetics (Slovak Republic)
A. A. Svintsov, Institute of Microelectronics Technology (Russia)


Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)

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