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Proceedings Paper

keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)
Author(s): Robert Fedosejevs; Romuald Bobkowski; James N. Broughton; B. Harwood
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Paper Abstract

A keV x-ray source based on plasma production using a high repetition rate picosecond KrF laser has been developed. By using a train of 50 ps input pulses to extract a KrF amplifier module an output train of pulses of energy up to 200 mJ has been obtained leading to generation of 1.15 keV x-rays from solid copper targets with a conversion efficiency from laser light to x-rays of over 1.5%. Iron and nickel targets yield softer x-ray spectra with higher conversion efficiencies of 2.3% and 1.8% respectively. When operated at 20 Hz in one atmosphere of background helium gas a point source of 1.15 keV x-rays with an average power of 45 mW is obtained. Initial characterization of the sensitivities of a positive resist, PBS, and a negative resist, Shipley XP90104C, have been carried out to demonstrate the effectiveness of the source.

Paper Details

Date Published: 9 July 1992
PDF: 10 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136027
Show Author Affiliations
Robert Fedosejevs, Univ. of Alberta (Canada)
Romuald Bobkowski, Univ. of Alberta (Canada)
James N. Broughton, Univ. of Alberta (Canada)
B. Harwood, Univ. of Alberta (Canada)

Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)

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