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Proceedings Paper

Application of a 2-D atomic force microscope system to metrology
Author(s): Diana Nyyssonen; Laszlo Landstein; E. Coombs
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Paper Abstract

This paper describes a 2-D atomic force microprobe (AFM) system designed specifically for accurate submicron critical dimension (CD) metrology. The system includes 2-D AFM sensing, 3-D position interferometry with 1.25 nm sensitivity, and a special tip design. Unlike conventional AFM scanning systems, the system operates like a nanorobot moving from point to point under computer control and sensing surfaces without making contact. The system design, operating characteristics, and application to metrology are

Paper Details

Date Published: 1 February 1992
PDF: 9 pages
Proc. SPIE 1556, Scanning Microscopy Instrumentation, (1 February 1992); doi: 10.1117/12.134902
Show Author Affiliations
Diana Nyyssonen, IBM/East Fishkill Facility (United States)
Laszlo Landstein, IBM/East Fishkill Facility (United States)
E. Coombs, IBM/East Fishkill Facility (United States)


Published in SPIE Proceedings Vol. 1556:
Scanning Microscopy Instrumentation
Gordon S. Kino, Editor(s)

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