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Proceedings Paper

Removal rates of fused silica with cerium oxide/pitch polishing
Author(s): Aleta A. Tesar; Baruch A. Fuchs
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Paper Abstract

The polishing removal rates of fused silica under 20 test conditions have been characterized by the resulting Preston coefficients and an inspection of surface quality using a Nomarski microscope and an optical heterodyne profilometer. Preston coefficient values of > 16 X 10-14 cm3/dyne-cm have been established, approximately a factor of 10 higher than cited previously. However, operational variables can reduce removal rates significantly. Process parameters are shown to have an effect on surface quality that has been related to surface deposits. The effects of chemical additives on removal rates were of special interest. Of importance here is not necessarily the introduction of such additives in practice. The results may improve our understanding of the chemistry of polishing.

Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1531, Advanced Optical Manufacturing and Testing II, (1 January 1992); doi: 10.1117/12.134876
Show Author Affiliations
Aleta A. Tesar, Lawrence Livermore National Lab. (United States)
Baruch A. Fuchs, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 1531:
Advanced Optical Manufacturing and Testing II
Victor J. Doherty, Editor(s)

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