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Proceedings Paper

Etching process investigation of anodic oxide on Hg0.8Cd0.2Te
Author(s): Gwo-Jen Jan; Shi-Chen Chao; Kuo-Tung Hsu
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Paper Abstract

The electrolyte electroreflectance and reflectivity measurements were used to study the etching process and analyze the etching mechanism of etched anodic oxide film on HgCdTe. The observed shift of the energy peak in reflectance spectrum can be explained by the surface roughness. It was found that the oxide etched by HCl or HNO3 does not recover the original reflectivity spectra due to the surface characteristics, but lactic acid does. The multiple reflection theory was used to calculate the thickness and the etching rate of the oxide film. The etching characteristics of lactic acid have also been studied for different concentrations.

Paper Details

Date Published: 26 October 1992
PDF: 8 pages
Proc. SPIE 1814, Optical Sensors, (26 October 1992); doi: 10.1117/12.131272
Show Author Affiliations
Gwo-Jen Jan, National Taiwan Univ. (Taiwan)
Shi-Chen Chao, National Taiwan Univ. (Taiwan)
Kuo-Tung Hsu, National Taiwan Univ. (Taiwan)

Published in SPIE Proceedings Vol. 1814:
Optical Sensors
Chih-Hong Chen; Tieh-Chu Wang, Editor(s)

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