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Proceedings Paper

InxGa1-xAsyP1-y (0.53
Author(s): Wei Lin; Yuan-Kuang Tu; Ting-Arn Dai; Wen-Jeng Ho; Chuan-Yang Chang; Gwo-Yue Lee
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Paper Abstract

A systematic study in the growth of InxGa1-xAsyP1-y (0.53 < x < 1, 0 < y < 1) compound semiconductor and it's application to laser diode structure has been carried out by the low-pressure organometallic vapor phase epitaxy (LP- OMVPE) technique. The indium (In), gallium (Ga), arsenic (As) and phosphorus (P) incorporation efficiencies were studied by varying the flow-rate of source gases. At the optimized growth conditions, the In incorporation efficiency has been found about 0.7 as compared with Ga's in both In.53Ga.47As and InGaAsP epilayers, and the Ga composition can be adjusted simply by varying the trimethylgallium (TMG) flow-rate linearly. However, the P incorporation efficiency is found much lower than the A's. Furthermore, we found that the As composition in InxGa1-xAsyP1-y quaternary epilayer (Q layer) is determined by arsine (AsH3) flow-rate not by the AsH3/PH3 flow-rate ratio in gas phase. The hydride flow-rates concerning in experimental growth of Q layer has been explained by the proposed As/P competition model and then formulated. According to this model, the AsH3 flow-rate is found proportional to y2.24259(1-y)-0.27138. For the final purpose, the graded index- separate confinement heterostructure (GRIN-SCH) and quantum wells (QW) for laser diode structure have been grown and demonstrated.

Paper Details

Date Published: 23 October 1992
PDF: 8 pages
Proc. SPIE 1813, Optoelectronic Component Technologies, (23 October 1992); doi: 10.1117/12.131254
Show Author Affiliations
Wei Lin, Telecommunication Labs. (Taiwan)
Yuan-Kuang Tu, Telecommunication Labs. (Taiwan)
Ting-Arn Dai, Telecommunication Labs. (Taiwan)
Wen-Jeng Ho, Telecommunication Labs. (Taiwan)
Chuan-Yang Chang, Telecommunication Labs. (Taiwan)
Gwo-Yue Lee, Telecommunication Labs. (Taiwan)


Published in SPIE Proceedings Vol. 1813:
Optoelectronic Component Technologies
GouChung Chi; Chi-Shain Hong, Editor(s)

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