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Proceedings Paper

Analysis of the effects of traversing torch and deposited layer thickness on particle deposition in the modified chemical vapor deposition process
Author(s): Mansoo Choi; Kyung-Soon Park
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Paper Abstract

A study has been carried out for the particle deposition during the Modified Chemical Vapor Deposition (MCVD) process. The analysis includes thermophoretic particle transport in the gas flow inside the tube and heat transfer through the solid layer with considering variable properties for both gas and solid regions. A notable feature of the study is to consider the effects of the periodic heating due to repeatedly traversing of the torch including the effects of the increasing solid layer thickness as the particles deposit. The localized heating of the moving torch is modelled as a gaussian heat flux boundary condition on the tube wall and the surface temperature distribution and the deposition efficiency results in good agreement with the existing experimental data. Of particular interest are the effects of torch speeds and solid layer thicknesses on the efficiency and the rate of deposition of particles, and the tapered length.

Paper Details

Date Published: 23 October 1992
PDF: 10 pages
Proc. SPIE 1813, Optoelectronic Component Technologies, (23 October 1992); doi: 10.1117/12.131253
Show Author Affiliations
Mansoo Choi, Seoul National Univ. (South Korea)
Kyung-Soon Park, Seoul National Univ. (South Korea)

Published in SPIE Proceedings Vol. 1813:
Optoelectronic Component Technologies
GouChung Chi; Chi-Shain Hong, Editor(s)

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