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Proceedings Paper

Vacuum-vapor-deposited thin films of benzo[a]phenoxazone-5 derivatives as photoresist layers: properties versus deposition parameters
Author(s): Vladimir Enokovich Agabekov; Yurii Ivanovich Gudimenko; Olga Evgenyevna Ignasheva
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Paper Abstract

The phisico-chemical properties of the benzo [a] phenoxazone-5 derivatives and their vacuum-deposited thin films (optical absorption, phase and chemical compositions, free surface energies of the films, and their supermolecular structures) have been studied. Changes in the vapor phase ratio of the dye derivatives have been investigated dependent on the boat- evaporator temperature, and chemical structures of the transformation products have been established. The films of different structure phase states have been obtained dependent on the formation conditions. Thin films of 9-diethylamino-3-methacryloyloxy-5H-benzo [a] phenoxaz-5-dicyanmethylene display good light-sensitive and masking properties and are suitable for submicron patterning under UV-exposure with (lambda) equals 266 nm.

Paper Details

Date Published: 1 August 1992
PDF: 7 pages
Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992); doi: 10.1117/12.131006
Show Author Affiliations
Vladimir Enokovich Agabekov, Institute of Physical-Organic Chemistry (Belarus)
Yurii Ivanovich Gudimenko, Institute of Physical-Organic Chemistry (Belarus)
Olga Evgenyevna Ignasheva, Institute of Physical-Organic Chemistry (Belarus)

Published in SPIE Proceedings Vol. 1783:
International Conference of Microelectronics: Microelectronics '92
Andrzej Sowinski; Jan Grzybowski; Witold T. Kucharski; Ryszard S. Romaniuk, Editor(s)

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