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Proceedings Paper

KrF excimer laser etching of diamondlike carbon films
Author(s): Taras V. Kononenko; Vitali I. Konov; Victor G. Ralchenko; V. E. Strelnitsky
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Paper Abstract

Diamond-like carbon films with mass density, ranging from 1.7 g/cm3 to 2.4 g/cm3, deposited onto Si in RF glow discharge plasma in benzene were characterized by various techniques in order to obtain a correlation between mechanical, electrical, optical, and thermal properties of the films. Microhardness and optical absorption increase, while electrical resistivity and thermal diffusivity decrease with film density. Etching of DLC films by UV pulses of KrF excimer laser radiation in air was studied. The etch rate was found to decrease with film density. Two etch mechanisms have been identified: (1) carbon oxidation, which provides etch rates V < 5 nm/pulse, and (2) ablation dominating at high fluences (E > 500 mJ/cm2) with V exceeding 100 nm/pulse. Micron-sized patterns in carbon films fabricated by laser etching technique are demonstrated.

Paper Details

Date Published: 20 November 1992
PDF: 9 pages
Proc. SPIE 1759, Diamond Optics V, (20 November 1992); doi: 10.1117/12.130765
Show Author Affiliations
Taras V. Kononenko, General Physics Institute (Russia)
Vitali I. Konov, General Physics Institute (Russia)
Victor G. Ralchenko, General Physics Institute (Russia)
V. E. Strelnitsky, Institute of Physics and Technology (Ukraine)


Published in SPIE Proceedings Vol. 1759:
Diamond Optics V
Albert Feldman; Sandor Holly, Editor(s)

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