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Proceedings Paper

Scanning tunneling microscope to evaluate supersmooth surface roughness
Author(s): Jingchi Yu; Lantian Hou; J. Wei; J. E. Yao; Jianlin Cao; Junyi Yu
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Paper Abstract

Our group has developed a surface roughness measuring system for supersmooth optics based on scanning tunneling microscopy techniques, which includes the assessment of two dimensional and three dimensional surface roughness parameters. The system has been applied to topographic mapping of superpolished Si wafer coated with single layer Mo film. The measuring precision of measured Rms, Ra and P-V value, if expressed with standards deviation (sigma) s, is 0.06 nm, 0.05 nm and 0.19 nm, respectively, which has achieved atomic resolution.

Paper Details

Date Published: 10 December 1992
PDF: 9 pages
Proc. SPIE 1752, Current Developments in Optical Design and Optical Engineering II, (10 December 1992); doi: 10.1117/12.130727
Show Author Affiliations
Jingchi Yu, Changchun Institute of Optics and Fine Mechanics and Beijing Lab. (China)
Lantian Hou, Jilin Univ. of Technology and Beijing Lab. of Electron Microscope (China)
J. Wei, Beijing Lab. of Electron Microscope (China)
J. E. Yao, Beijing Lab. of Electron Microscope (China)
Jianlin Cao, Changchun Institute of Optics and Fine Mechanics (China)
Junyi Yu, Jilin Univ. of Technology (China)


Published in SPIE Proceedings Vol. 1752:
Current Developments in Optical Design and Optical Engineering II
Robert E. Fischer; Warren J. Smith, Editor(s)

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