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Proceedings Paper

Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)
Author(s): Dmitrii R. Ilkayev; Tariel M. Makhviladze; Kamil A. Valiev
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Paper Details

Date Published: 1 June 1992
PDF: 54 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130373
Show Author Affiliations
Dmitrii R. Ilkayev, Institute of Physics and Technology (Russia)
Tariel M. Makhviladze, Institute of Physics and Technology (Russia)
Kamil A. Valiev, Institute of Physics and Technology (Russia)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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