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Proceedings Paper

High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser
Author(s): Peter Lokai; Ulrich Rebhan; Uwe Stamm; Hermann Buecher; Hans-Juergen Kahlert; Dirk Basting
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Paper Abstract

The bandwidth requirements 1, 2, 3, 4, 5 on DUV 248 nm lithography laser sources, in general, are a function of a number of physical parameters. For example, the stepper lens, the image field size and the required resolution. The trend towards larger field sizes in new DUV-stepper lenses has resulted in a bandwidth need of below 2 ?m for a lorentzian spectral distribution.

Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130371
Show Author Affiliations
Peter Lokai, Lambda Physik GmbH (Germany)
Ulrich Rebhan, Lambda Physik GmbH (Germany)
Uwe Stamm, Lambda Physik GmbH (Germany)
Hermann Buecher, Lambda Physik GmbH (Germany)
Hans-Juergen Kahlert, Lambda Physik GmbH (Germany)
Dirk Basting, Lambda Physik GmbH (Germany)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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