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Proceedings Paper

Resolution enhancement of stepper by complementary conjugate spatial filter
Author(s): Minori N. Noguchi; Yasuhiro Yoshitake; Yukio Kembo
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Paper Abstract

An ultra-high resolution stepper is proposed, which combines annular illumination and a complementary conjugate spatial filter. This technique reproduces deep submicron complex non-repeated patterns by relatively emphasizing the diffracted light from high spatial-frequency patterns. Images of several patterns are simulated for a conventional stepper, a stepper with phase shifting, and for the proposed technique. The results indicate that this technique has the potential to pattern 0.3-|im images using an i-line stepper with 0.5 N.A. with conventional masks. It should enable stepper ranges to be extended to the next generation of DRAMs.

Paper Details

Date Published: 1 June 1992
PDF: 7 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130370
Show Author Affiliations
Minori N. Noguchi, Hitachi, Ltd. (Japan)
Yasuhiro Yoshitake, Hitachi, Ltd. (Japan)
Yukio Kembo, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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