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Proceedings Paper

Rigorous and practical vector model for phase-shifting masks in optical lithography
Author(s): Kevin D. Lucas; Chi-Min Yuan; Andrzej J. Strojwas
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Paper Abstract

A new vector (true two-dimensional) optical lithography modeling program, METROPOLE, is presented which incorporates arbitrary mask geometries. This rigorous model is thus ideally suited for the simulation of phase shifting masks. The efficiency of the electric field calculations, both within the mask and on the substrate structures, allows its use on accessible engineering workstations. Several simulation examples are presented, and include the new phase shifting on the substrate technique (POST).

Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130369
Show Author Affiliations
Kevin D. Lucas, Carnegie Mellon Univ. (United States)
Chi-Min Yuan, Carnegie Mellon Univ. (United States)
Andrzej J. Strojwas, Carnegie Mellon Univ. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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