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Proceedings Paper

Rigorous and practical vector model for phase-shifting masks in optical lithography
Author(s): Kevin D. Lucas; Chi-Min Yuan; Andrzej J. Strojwas
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130369
Show Author Affiliations
Kevin D. Lucas, Carnegie Mellon Univ. (United States)
Chi-Min Yuan, Carnegie Mellon Univ. (United States)
Andrzej J. Strojwas, Carnegie Mellon Univ. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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