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Proceedings Paper

Holographic mask-aligner
Author(s): Francis S. M. Clube; Simon Gray; Massoud Hamidi; Basil Arthur Omar; Denis Struchen; Jean-Claude Tisserand
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Paper Abstract

Total internal reflection holography permits high resolution, non-contact lithography over very large fields. A prototype lithographic system has been constructed employing scanning illumination, focus and alignment subsystems integrated onto a 4" wafer handling mechanism. Resolution down to 0.25u has been achieved with a present alignment capability of <1u. A fine alignment system under development has been demonstrated to be capable of <0.1u accuracy. The technology is well suited to many applications, including flat panel displays, DRAMs, surface acoustic wave devices and optical storage disks.

Paper Details

Date Published: 1 June 1992
PDF: 10 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130368
Show Author Affiliations
Francis S. M. Clube, Holtronic Technologies (Switzerland)
Simon Gray, Holtronic Technologies (Switzerland)
Massoud Hamidi, Holtronic Technologies (Switzerland)
Basil Arthur Omar, Holtronic Technologies (Switzerland)
Denis Struchen, Holtronic Technologies (Switzerland)
Jean-Claude Tisserand, Holtronic Technologies (Switzerland)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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