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Proceedings Paper

Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules
Author(s): Barton A. Katz; James S. Greeneich; Richard Rogoff; Steve D. Slonaker; Stefan Wittekoek; Paul Frank Luehrmann; Martin A. van den Brink; Douglas R. Ritchie
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Paper Details

Date Published: 1 June 1992
PDF: 16 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130363
Show Author Affiliations
Barton A. Katz, ASM Lithography, Inc. (United States)
James S. Greeneich, ASM Lithography, Inc. (United States)
Richard Rogoff, ASM Lithography, Inc. (United States)
Steve D. Slonaker, ASM Lithography, Inc. (United States)
Stefan Wittekoek, ASM Lithography BV (Netherlands)
Paul Frank Luehrmann, ASM Lithography BV (Netherlands)
Martin A. van den Brink, ASM Lithography BV (Netherlands)
Douglas R. Ritchie, ASM Lithography BV (Netherlands)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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