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Proceedings Paper

Modeling of optical images in resists by vector potentials
Author(s): Hiroyoshi Tanabe
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Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130360
Show Author Affiliations
Hiroyoshi Tanabe, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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