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Proceedings Paper

Novel 0.2-um i-line lithography using phase-shifting on the substrate
Author(s): Hiroki Tabuchi; Takayuki Taniguchi; Hiroyuki Moriwaki; Makoto Tanigawa; Keichiro Uda; Keizo Sakiyama
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Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130359
Show Author Affiliations
Hiroki Tabuchi, Sharp Corp. (Japan)
Takayuki Taniguchi, Sharp Corp. (Japan)
Hiroyuki Moriwaki, Sharp Corp. (Japan)
Makoto Tanigawa, Sharp Corp. (Japan)
Keichiro Uda, Sharp Corp. (Japan)
Keizo Sakiyama, Sharp Corp. (Japan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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