Share Email Print

Proceedings Paper

In-process image detection technique for determination of overlay and image quality for ASM-L wafer stepper
Author(s): Rainer Pforr; Stefan Wittekoek; Roland Van Den Bosch; Luc Van den Hove; Rik M. Jonckheere; Theo Fahner; Rolf Seltmann
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 June 1992
PDF: 15 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130355
Show Author Affiliations
Rainer Pforr, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Stefan Wittekoek, ASM Lithography BV (Netherlands)
Roland Van Den Bosch, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Luc Van den Hove, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Rik M. Jonckheere, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Theo Fahner, ASM Lithography BV (Netherlands)
Rolf Seltmann, Fraunhofer Institut fuer Mikroelektronische Schaltungen und System (Germany)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

© SPIE. Terms of Use
Back to Top